Copper foil

Copper foilProduct Name Name: Copper foil Product Overview CVD graphene specific copper foil is a special material with important applications in the field of graphene preparation. Before growing graphene, the copper foil is annealed at a substrate temperature of 1000 Cfor 30 minutes to promote the growth of copper grains, reduce the nucleation prone areas of graphene such as grain boundaries, and lower the nucleation density during graphene growth. Technical

Product Name

Name: Copper foil

^{Product Overview}

CVD graphene specific copper foil is a special material with important applications in the field of graphene preparation. Before growing graphene, the copper foil is annealed at a substrate temperature of 1000 ¡ãCfor 30 minutes to promote the growth of copper grains, reduce the nucleation prone areas of graphene such as grain boundaries, and lower the nucleation density during graphene growth.

^{Technical Parameter}

Size: 20 x 30 cm

Thickness: ~25μm

Purity: > 99.9wt%

^{Product Features}

High purity can effectively reduce the interference of impurities on the growth process of graphene, thereby ensuring the crystalline quality and electrical properties of graphene.

The surface flatness and smoothness are excellent. The smooth surface provides an ideal substrate for the uniform growth of graphene, which helps to form continuous, large-area, and uniformly performing graphene films.

Application Fields

Used for CVD method to produce feldspar graphene.

^{Related Information}

^{Please e-mail for the detailed characterization data.}

E-mail:[email protected]